Optical Thin Film Formation Device Genesis-AR Series
Ideal for film formation on high curvature lenses and ball lenses, which is difficult with sputtering.
In the optical thin film process, by using the ALD (Atomic Layer Deposition) method, which is different from the commonly used deposition and sputtering techniques, it has become possible to form high-quality thin films with excellent conformity on substrates such as ball lenses and high-curvature lenses, which have been considered difficult until now. 【Overview】 ○ Up to 50 φ10 inch substrates can be processed at once (25 substrates × 2 axes) * This varies depending on the substrate shape and conditions. ○ Equipped with a substrate rotation mechanism.
- Company：昭和真空
- Price：Other
